Vacuum Deposition is process of deposition of a thin film or a coating made under vacuum or a low-pressure plasma environment on a substrate. This is purely a physical process rather than involving a chemical reaction. The contact area of Reed switches and related products can be vacuum deposited.
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Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings. The process can be qualified by the vapor source; physical vapor deposition uses a liquid or solid source and chemical vapor deposition uses a chemical vapor.
